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25% Hydroxyethyl urea/aminosulfonic acid compound*
as well as provitamin D3
The mask and cream form the perfect synergistic duo
a tired look
natuurlijke cholesterol
LRP Posthelios Aftersun Dagverzorging 25% Hydroxyethyl urea/aminosulfonic acid compound*La Roche Posay's Posthelios Aftersun is a dermatological aftersun that melts into the skin and helps it recover after sun exposure. Thermal spring water, a key ingredient, instantly cools warm, sunburned skin and helps restore moisture. For skin that feels healthy and soft after sunbathing.
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